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                      Diethylene glycol monoethyl ether acetate(DCAC)&Ethyl 3-ethoxypropionate(EEP)

                      Item

                      Diethylene glycol monoethyl ether acetate (DCAC)

                      Ethyl 3-ethoxypropionate(EEP)

                      CAS

                      112-15-2  

                      763-69-9

                      Molecular formula

                      CH3COOCH2CH2OCH2CH2OC2H5

                      C2H5OCH2CH2COOC2H5

                      Appearance

                      Colorless and clear liquid

                      Colorless and clear liquid

                      Purity %(GC)≥

                      99.0

                      99.5

                      Distillation range(℃/760mmHg)

                      213.0-223.0

                      165-172

                      Moisture(KF) %≤

                      0.05

                      0.05

                      Alcohol content%≤

                      /

                      0.1

                      Acidity (as HAC) %≤

                      0.03

                      /

                      Specific gravity (d420)

                      1.010±0.005

                      0.951±0.005

                      Color(Pt-Co)≤

                      10

                      10

                      Package and transportation

                      200KGS/Drum Common chemical

                      200KGS/Drum Common chemical

                      Application:

                      DCAC, a kind of environment-friendly and low-volatile solvent with excellent performance, is widely applied in electronic industry as cleaning agent, high resistance solvent, diluting agent of optical resist, optical resist remover, stripping agent, detergent for IC, photo resist-removing buffer solution, solution resin, etc.

                      EEP has strong solubility both for polar and non-polar substance with low volatility, low odor, low surface tension and high electrical resistance. It can be used in high resistance solvent, diluting agent of optical resist, optical resist remover, stripping agent, detergent for IC, photo resist-removing buffer solution, corrosive processing and other chemicals requiring special specification.

                       
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